300~380 T abs <1% , T=50%@405nm +- 10nm f.ws\^v%
425~680 Tave >90% , T=50%@720nm +-10nm aj$&~-/
R
780~1200 nm T ave <1% M HKnHPv
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用 (0.5H L 0.5H)^s (0.5L H 0.5L)^s (0.5L H 0.5L)^s 3個(gè)膜堆(2短1長(zhǎng) ) 1<pb=H
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H: Ta2O5 L:SiO2 NV;T*I8O
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該如何設(shè)計(jì)